片上无源器件模型研究

 2022-02-14 09:02

论文总字数:25822字

摘 要

在如今无线通信技术高速发展的同时,IC产业的发展越来越需要高频率、大输出功率的高性能半导体器件。传统的基于硅和砷化镓的半导体微波功率晶体管由于受到材料参数的限制已经接近性能的极限。而如今以GaN(氮化镓)为主的宽禁带半导体材料为衬底的器件,由于能够满足电路系统对高频率、高输出功率的要求,并能工作在较高温度条件下,成为了近年来研究的热点。

目前,大多数对于GaN工艺的研究都集中在有源器件,例如HEMT和MOSFET,并已经获得了在等效电路模型中一些成绩。然而对于无源器件等效电路模型领域的研究却相对较少,而通常使用基于硅基过程模型。在无源器件的等效电路模型的研究空白在电路仿真方面造成很多麻烦,尤其是在前仿真及后仿真上表现明显。因此一定程度上我们可以说,对于无源器件的研究是进一步集成电路研究的一个重点。

在本文中,研究了GaN(氮化镓)工艺下的无源器件模型。建立了电阻的等效电路模型,在介绍了氮化镓电阻等效电路中寄生电感、寄生电容的提取方法后,对等效电路模型进行了多次优化。最终在2到40GHz 频率范围内,等效电路模型仿真结果与测量数据拟合情况较好。

本文也在分析了片上螺旋电感的基本物理结构及元件参数后,提出了一个的单π等效电路模型。该模型包含11种元件,能够在较大的频率范围内满足测试得到的特性曲线。在参数提取的过程中使用迭代特征函数的方法精确提参。根据拟合结果,这个模型有效的展现了GaN工艺的片上电感在0-4GHz条件下的参数特征,其中特别是片上单圈螺旋电感。

关键词:建模;氮化镓工艺;无源器件;参数提取;电阻;电感

ABSTRACT

With rapid de-embeddingvelopment of microwave and aviation technology, it set high de-embeddingmands on semiconductor de-embedding with higher work frequency and output power. Because of the limit of material parameters, the performance of traditional microwave power transistor based on Si and GaAs can not be improved further, while for semiconductor material GaN ,the band gap is wide-embeddingr, de-embeddings with these materials can satisfy the system requirement of high frequency, high output power, and high temperature. It has recently become the focus of research.

Currently, most of the research on GaN process are focusing on active de-embeddings, for example, HEMT and MOSFET, and have gained some achievements in equivalent circuit mode-embeddingl . However, as to passive de-embeddings, there is less research in the fields of equivalent circuit mode-embeddingl and it is common to employ the mode-embeddingl based on silicon-based process. The blank space in equivalent circuit mode-embeddingl of passive de-embeddings caused much trouble in circuit simulation, reflecting in the difference between pre-simulation and post-simulation.To some de-embeddinggree, it is a key point for further integrated circuit research.

In this paper, the GaN passive components mode-embeddingl based on the GaN pHEMTs fabrication process are studied. We present an equivalent circuit for GaN resistors incorporating some parasitics .The method of parameter extraction for GaN equivalent circuit is de-embeddingrived comprehensively and scientifically. We also improve the equivalent circuit. As applied to the improved equivalent circuit, the extracted parameters can simulate the resistors with a high precision from 2 to 40 GHz.

This paper also introduces spiral inductance structure and working principle. And then a novel single-π equivalent circuit mode-embeddingl for on-chip inductors with GaN process is also presented in this paper. The mode-embeddingl consists of 11 elements and can feature the frequency-de-embeddingpende-embeddingnt characteristics well in a wide-embedding range. The iteration and the characteristic function method are employed to construct a brand new algorithm to extract each parameters accurately. The mode-embeddingl is tested by five different inde-embeddingxes and fits the measured data very well. According to the results, the mode-embeddingl proves effective for GaN on-chip inductor, especially single coil inductor.

Key words:mode-embeddingling;GaN technology;passive components;parameter extraction;resistors;inductance

目 录

摘要 I

目 录 III

第一章 综述 1

1.1研究背景 1

1.1.1引言 1

1.1.2 GaN材料特性 1

1.1.3 GaN工艺 2

1.2国内外研究概况 2

1.3本文的主要研究工作 3

1.3.1研究内容 4

1.3.2研究意义 4

1.4章节安排 4

第二章 片上无源器件 5

2.1无源器件的射频特性 5

2.2 高频电阻 5

2.2.1 趋肤效应(skin effect) 5

2.3 片上螺旋电感 5

2.3.1片上螺旋电感的物理参数 6

第三章 器件等效电路模型 7

3.1器件等效电路模型 7

3.1.1集总参数 7

3.1.2分布参数 7

3.1.3等效电路模型建立 8

3.2二端口器件参数 8

3.2.1 Z参数 8

3.2.2 Y参数 9

3.2.3 S参数 10

3.3去嵌技术 11

3.3.1 简单开路剥离法(open法) 12

3.3.2 开路短路剥离法(open-short法) 13

3.3.3 开路通路剥离法(open-through法) 15

3.3.4 不同二端口元件参数剥离方法的比较 16

第四章 电阻 16

4.1片上薄膜电阻 16

4.1.1片上薄膜电阻版图 16

4.1.2片上薄膜电阻制备 18

4.2薄膜电阻建模及参数提取 18

4.2.1 去外嵌方法选择 19

4.2.2拓扑模型一 19

4.2.3拓扑模型二 20

4.2.4拓扑模型三 21

4.4薄膜电阻模型验证 24

第五章 电感 25

5.1电感元件的基本定义 25

5.1.1 自谐振频率SRF 25

5.1.2 品质因数Q 26

5.2 电感结构 27

5.3片上螺旋电感建模 27

5.3.1理论分析 28

5.3.2模型的建立及改进 29

5.4模型验证 32

5.4.1 S参数拟合 32

第六章 总结 32

6.1研究总结 32

6.2研究展望 33

致谢 34

参考文献(References) 34

第一章 综述

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